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Future Requirements on Optics for Lithography in the sub 100 nm Range

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Abstract

As the semiconductor industry follows the trend to higher integration of functionalities on a chip while increasing the speed of the operations the feature sizes on a chip continue to shrink at a rate of 30 % every two years. The imaging capabilities of optical lithography tools are the key enablers to support this trend.

© 2002 Optical Society of America

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