Abstract
Progress to smaller lithographic feature sizes continually presents new challenges. 157nm technology is a promising new step along this path. The major challenges encountered to date include environmental purging and contamination as well as intrinsic properties of the material at this short wavelength. Accurate characterization of lens performance must therefore be done at the wavelength of use so as to include these effects.
© 2002 Optical Society of America
PDF ArticleMore Like This
John H. Burnett
OTuC3 Optical Fabrication and Testing (OF&T) 2002
Keith B. Doyle, Jeffrey M. Hoffman, Victor L. Genberg, and Gregory J. Michels
IWC1 International Optical Design Conference (IODC) 2002
Tomoyuki Matsuyama and Yuichi Shibazaki
IMD4 International Optical Design Conference (IODC) 2002