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Conferences > OFT > 2002 > OWC > OWC1

Subaperture stitching interferometer for versatile and accurate surface metrology

P.R. Dumas, J.F. Fleig, G.W. Forbes, and P.E. Murphy

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Abstract

We have incorporated system calibration within the familiar stitching process. Stitching inherently extends the testable aspheric departure and aperture sizes (both NA and CA), and we now show that it can also boost accuracy.

© 2002 Optical Society of America

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