Laser smoothing of reactive ion-etched (RIE) gratings and arbitrary multi-step structures in silica by a CO2 laser is shown to provide controlled relaxation of etched step features over scale lengths between 2µm and 30µm. Step heights of 1µm or less relax symmetrically, giving uniform edge softening. Asymmetry of the relaxation is seen for 3µm step height. However, the process enhances unwanted undercuts and grooves produced by etching errors. The process is promising for the production of low light scatter micro-optic components using low-cost binary or multi-level etched structures as a precursor

© 2008 Optical Society of America

PDF Article
More Like This
Fabrication of refractive and diffractive micro-optical structures in diamond

Mikael Karlsson and Fredrik Nikolajeff
DMB2 Diffractive Optics and Micro-Optics (DOMO) 2002

Fabrication of Micro-channels in Optical Fibers Using Femtosecond Laser Pulses and Selective Chemical Etching

Y. Lai, K. Zhou, M. Dubov, L. Zhang, and I. Bennion
OTuL4 Optical Fiber Communication Conference (OFC) 2006

Micro- and Nanostructures inside Sapphire by fs-Laser Irradiation and Selective Etching

Dirk Wortmann, Jens Gottmann, Nelli Brandt, and Herbert Horn-Solle
CTuG4 Conference on Lasers and Electro-Optics (CLEO) 2008


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access Optica Member Subscription