Application of the NANOMEFOS Non-contact Measurement Machine in Asphere and Freeform Optics Production

R. Henselmans; G. Gubbels; C. van Drunen

doi:10.1364/OFT.2010.JMB47P

International Optical Design Conference and Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper JMB47P
•https://doi.org/10.1364/OFT.2010.JMB47P

Application of the NANOMEFOS Non-contact Measurement Machine in Asphere and Freeform Optics Production

R. Henselmans, G. Gubbels, and C. van Drunen

Optical Fabrication and Testing 2010

Jackson Hole, Wyoming United States
13–17 June 2010
ISBN: 978-1-55752-893-3

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Joint IODC/OF&T Poster Session (JMB)

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R. Henselmans, G. Gubbels, and C. van Drunen, "Application of the NANOMEFOS Non-contact Measurement Machine in Asphere and Freeform Optics Production," in International Optical Design Conference and Optical Fabrication and Testing , OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper JMB47P.

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Abstract

The NANOMEFOS machine is capable of fast, non-contact and universal measurement of aspheres and freeforms, up to ∅500 mm with a measurement uncertainty below 30 nm (2σ). It is now being applied in asphere and freeform production at TNO.

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