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  • International Optical Design Conference and Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2010),
  • paper OWA2
  • https://doi.org/10.1364/OFT.2010.OWA2

A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate

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Abstract

A simple method to optimize the etching uniformity when making a CGH on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).

© 2010 OSA, SPIE

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