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Conferences > OFT > 2014 > OM4B > OM4B.2

Contamination of fused silica optics surface after magnetorheological polishing

P. Cormont, R. Catrin, J. Neauport, D. Taroux, C. Maunier, S. Lambert, and O. Rondeau

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Abstract

Quantities of pollutants present in silica optics polished by MRF are measured with ICP-AES after wet chemical etching. Iron contamination is mostly confined in two μm thick layer at surface and decreases exponentially with depth.

© 2014 Optical Society of America

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