Ion Beam Processing for Coating onto Ambient Temperature Substrates

C. M. Kennemore; U. J. Gibson

doi:10.1364/OIC.1984.ThB2

Third Topical Meeting on Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1984),
paper ThB2
•https://doi.org/10.1364/OIC.1984.ThB2

Ion Beam Processing for Coating onto Ambient Temperature Substrates

C. M. Kennemore and U. J. Gibson

Optical Interference Coatings 1984

Monterey, California United States
17–19 April 1984
ISBN:

From the session
Deposition Processes I (ThB)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
C. M. Kennemore and U. J. Gibson, "Ion Beam Processing for Coating onto Ambient Temperature Substrates," in Third Topical Meeting on Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1984), paper ThB2.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

The use of ion beams for processing optical coatings is receiving increasing attention. The ions incident on the growing film have been shown to increase the packing density and moisture resistance of the coatings. The ions deliver kinetic energy locally to the growing film, promoting a more dense structure.

PDF Article

More Like This

Ion Beam Sputtered Anti-Reflection Coatings of Fused Silica Substrates

Michael S. Perlmutter and Kenneth R. Martin
ThC4 Optical Interference Coatings (OIC) 1984

Ion-Assisted Deposition of Optical Thin Films: Low Energy vs. High Energy Bombardment

J. R. McNeil, G. A. Al-Jamaily, and A. C. Barron
ThB3 Optical Interference Coatings (OIC) 1984

Ionized-Cluster-Beam Deposition of Optical Interference Coatings

T. Takagi and I. Yamada
ThC2 Optical Interference Coatings (OIC) 1984

Previous Article Next Article