Abstract

Ion-beam-sputter deposition parameters of Ta₂O₅ films were investigated for using them as an optical coating material. Optical parameters of the films were found to be a sensitive function of oxygen fraction in the beam and total gas pressure during deposition. An oxygen fraction of 20% or higher in an Ar-O₂ mixture produced non-dispersive oxide films in the visible and infrared region of the spectrum. Refractive index of the samples were found to be in the range 2.05 - 2.15 and extinction coefficients to be 10^-5 - 30 × 10^-3 depending on both oxygen fraction and wavelength, λ (0.4< λ (μ) <2.0).

© 1984 Optical Society of America