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Ion-Plating of Silicon Nitride Optical Thin Films

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Abstract

Improving the optical and mechanical properties of optical thin films deposited by thermal evaporation is a great subject of interest and research. Ion-assisted deposition [1] has proven to be a very successfull technique to achieve high packing densities, relief of tensile stress, and elimination of water absortion bands provided films are grown stoichiometrically. Ion-plating, another ion assisted process, has been successful in growing dense oxide layers such as TiO2, SiO2, Al2O3, ZrO2, and Ta2O5 onto unheated substrates [2].

© 1988 Optical Society of America

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