Sputtering of Metal Oxides with an rf-Ion Source

Ingo Kessler; Juergen Mueller; Gerhard Steiniger

doi:10.1364/OIC.1988.ThD3

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1988),
paper ThD3
•https://doi.org/10.1364/OIC.1988.ThD3

Sputtering of Metal Oxides with an rf-Ion Source

Ingo Kessler, Juergen Mueller, and Gerhard Steiniger

Optical Interference Coatings 1988

Tucson, Arizona United States
12–15 April 1988
ISBN:

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Deposition Techniques: 2 (ThD)

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I. Kessler, J. Mueller, and G. Steiniger, "Sputtering of Metal Oxides with an rf-Ion Source," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1988), paper ThD3.

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Abstract

Ion beam of relatively low energy and large area have become a valueable tool in thin film production. The energies for the most important processes are several ten to several hundered eV for etching and ion assisted evaporation and several thousand eV for sputtering.

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