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Conferences > OIC > 1988 > TuC > TuC1

In-Situ Ellipsometric Monitoring and Modelling of the Growth and Synthesis of Thin Films

R.P. Netterfield, P.J. Martin, K.-H. Müller, W.G. Sainty, C.G. Pacey, and S.W. Filipczuk

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Abstract

In-situ ellipsometry is a powerful technique for monitoring the optical properties of thin films as a function of their thickness. Some results of measurements obtained during the growth of evaporated and ion-assisted films and during their ion-etching will be interpreted in terms of recently developed computer models.

© 1988 Optical Society of America

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