Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OIC > 1998 > MA > MA.4

Operation of a Gridless Ion Source for Ion Assisted Deposition

Wayne G Sainty

Open Access Open Access

Abstract

In a commercial optical coating environment, the significant benefits of the gridless end-Hall ion source have been exploited, resulting in a new design.

© 1998 Optical Society of America

PDF Article
More Like This
Application of Residual Stress Analysis for Ion-Assist-Deposited (IAD) Thin-Films Manufactured Using a Gridless End-Hall Ion Source

Michael L. Fulton, Fu Ji Kai, and Tan Fong Hock
TuA6 Optical Interference Coatings (OIC) 1995

Dense moisture stable titania and silica ion assisted deposited films deposited using a compact cold cathode ion source

Dale E. Morton and Vitaly Fridman
MA.6 Optical Interference Coatings (OIC) 1998

Ion-Assisted-Deposition using a High-Output End-Hall Ion Source

Michael L. Fulton and Robert Cabrera
MA.5 Optical Interference Coatings (OIC) 1998

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use