Abstract

Reactive D.C. magnetron sputtering is a physical vapor deposition method that produces films which are optically and mechanically superior to evaporated films in several respects.^1,2 This technique has the advantages of a higher deposition rate and fewer deposition parameters than ion beam sputtering. In this investigation it will be shown that by ion bombardment during deposition, the scatter and absorption of zirconia, and the scatter of silica films can be decreased. A decrease in scatter from zirconia/silica high reflectors was also observed.

© 1998 Optical Society of America