Keep-Molecules Sputtering Deposition of Magnesium Fluoride Thin Films

K. Kawamata; T. Shouzu

doi:10.1364/OIC.1998.MB.1

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1998),
paper MB.1
•https://doi.org/10.1364/OIC.1998.MB.1

Keep-Molecules Sputtering Deposition of Magnesium Fluoride Thin Films

K. Kawamata and T. Shouzu

Optical Interference Coatings 1998

Tucson, Arizona United States
7–12 June 1998
ISBN:

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K. Kawamata and T. Shouzu, "Keep-Molecules Sputtering Deposition of Magnesium Fluoride Thin Films," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1998), paper MB.1.

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Abstract

Magnesium fluoride thin films deposited by vacuum evaporation have been used for optical films such as anti-reflection coatings because of their low refractive index (n=1.38) and durability when condensed on heated substrates. In recent years, the demand for optical thin films by sputtering is increasing because of its advantages over vacuum evaporation in factory automation, and applicability to substrates at room temperature.

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