Abstract

Traditional chemical vapour deposition processes, as widely used in the semiconductor industry, involve the introduction of a vapour phase organometallic precursor material to the reaction chamber, where decomposition of the vapour to form a solid film is triggered by heating the substrate. CVD methods for fabrication of optical thin film devices are becoming increasingly popular and there is a continuing drive towards plasma based CVD systems which promote deposition at lower substrate temperatures, allowing film growth on less temperature tolerant substrates.

© 1998 Optical Society of America