Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Aspects of Plasma Assisted Chemical Vapour Deposition for Deposition of Graded Index Multilayers

Open Access Open Access

Abstract

Thin film structures have been produced with sinusoidal and step-wise index profiles. Results of time dependent plasma studies will be explained.

© 1998 Optical Society of America

PDF Article
More Like This
Narrow-Band Notch Filters produced by Plasma Impulse Chemical Vapour Deposition

R P Netterfield and Ian Llewellyn
MB.4 Optical Interference Coatings (OIC) 1998

Radical Activated Chemical Vapour Deposition of Oxides

R.H. Bennett, J. Simpson, and K.L. Lewis
MB.3 Optical Interference Coatings (OIC) 1998

Plasma Impulse Chemical Vapour Deposition - A Novel Technique for Optical Coatings

M. Heming, J. Hochhaus, J. Otto, and J. Segner
OThC1 Optical Interference Coatings (OIC) 1992

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved