Abstract

Titanium dioxide is hard, environmentally stable, transparent in the range of visible and near infrared and with a very high index. In our previous papers¹, we showed that the influence of oxygen partial pressure (P_O2) and the optimum post-baking temperature on ion-beam sputtering deposition (IBSD) of titanium dioxide (TiCh). At high baking temperature, such as 450 °C, the amorphous-crystalline transformation cause the k values increase2 and TiO2 •3 changes easily to oxygen deficient . Some areas of the surface draw down and form mildewlike micro structure. The morphology is so irregular due to thermal instability of titanium ions. The film micro structure can be improved by co-sputtering some materials4. In this paper we extend the investigation of the co-sputtering films with various compositions.

© 1998 Optical Society of America