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Conferences > OIC > 1998 > MC > MC.6

Fabrication of Distributed Bragg and quarter wave reflectors for visible to mid-IR applications by reactive sputtering of silicon oxides

J Simpson and AM Pitt

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Abstract

The reactive sputtering of silicon in oxygen is an attractive route to producing multilayer optical coatings as a wide range of indices can be produced simply by varying oxygen feed rate. Between the two extremes of pure Si and fully oxidised SiO2 the index varies continuously with oxygen content[1] . However the optical gap also varies with composition , which can limit the applications in the visible band.

© 1998 Optical Society of America

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