Abstract

Light scattering of optical thin films has been intensely studied for many years /1/, /2/ as it plays a major role in the development of low-loss optical coatings. More recently, with the Atomic Force Microscope (AFM) becoming a useful Instrument for surface characterization, advanced possibilities arose to comprehensively characterize the scatter losses of thin films in the context of microstrucure and roughness /3/,/4/. The increasing demands for high quality coatings in the ultraviolet spectral region, in particular the ongoing trend towards shorter wavelengths with its present focus on 193 nm optics, result in specific challenges for appropriate light scatter investigations.

© 1998 Optical Society of America