Abstract
Wideband in-situ optical monitoring enables the on-line characterization of optical coatings. Such characterization is an important part of the deposition error compensation process.1,2 In the case of bulk-like thin films and highly stable deposition processes it is possible to determine only one parameter, the current layer thickness, after the deposition of each layer.2 In the case of porous thin films and less stable deposition processes a reliable determination of optical coating parameters is more difficult, and a search for several parameters may be required after each layer deposition. A direct determination of multiple parameters from a single spectral monitoring scan may result in the instability of the determination of optical coating parameters. For this reason, a special mathematical treatment is required to provide stability of the on-line characterization procedure.
© 1998 Optical Society of America
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