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Conferences > OIC > 1998 > TuA > TuA.6

Relationship between mixed TiO2-SiO2 films and TiO2/SiO2 interfaces. A combination of spectroscopic ellipsometry and photoemission spectroscopy

D. Souche, S. Fisson, V. Nguyen Van, G. Vuye, Y. Wang-Leprince, F. Abelès, and J. Rivory

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Abstract

TiO2-SiO2 mixed oxides are very interesting materials from many points of view: these materials might be of interest as supports for industrial catalysts [1]; they can provide intermediate refractive indices between SiO2 (1.46) and TiO2 (2.4) for optical coatings and are useful in graded-index thin film structures [2]; the addition of SiO2 into TiO2 changes the film structure from polycrystalline to amorphous and decreases optical scatter [3]. In this work, we will emphasize their interest for the characterization of interfaces in TiO2/SiO2 multilayer stacks.

© 1998 Optical Society of America

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