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Reformulation of Optical Characterization of a Generic Thin Film-Substrate System through the Concept of Envelope-Extrema

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Abstract

Optical characterization of a deposited material can be done by many experimental and analytical means as is already known [1-2], depending on some factors, like the wavelength range of interest, the thickness, the proper material parameters (n and k), the structure modelization (inhomogeneity, surface rouhgness,..), etc. The presented contribution on optical characterization is related with a new treatment of the common basic formulation. This permits simpler analytical conclusions and explicit formulas for the obtention of optical and dimensional parameters. We will proceed under the context of photometric magnitudes and optical interference coatings, so we can add interferometric information to the analysis.

© 1998 Optical Society of America

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