Abstract

DC magnetron sputtering is the deposition process of choice for high volume production of ITO (indium-tin-oxide) coated devices. Depending on the process conditions the deposited ITO layer is either amorphous or crystalline. Both structures are significant for the manufacturing of STN and active matrix TFT devices. The major parameters that influence the structure and the film performance are discussed, showing how temperature, voltage, gas and target quality influence the resistivity and the optical parameters.

© 1998 Optical Society of America