Ras (Radical Assisted Sputtering) System And Its Application On Depositing Optical Thin Films

Ekishu Nagae; Takeshi Sakurai; Shigeharu Matsumoto

doi:10.1364/OIC.2001.MB5

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2001),
paper MB5
•https://doi.org/10.1364/OIC.2001.MB5

Ras (Radical Assisted Sputtering) System And Its Application On Depositing Optical Thin Films

Ekishu Nagae, Takeshi Sakurai, and Shigeharu Matsumoto

Optical Interference Coatings 2001

Banff Canada
ISBN: 1-55752-682-6

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Deposition of Optical Coatings II (MB)

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E. Nagae, T. Sakurai, and S. Matsumoto, "Ras (Radical Assisted Sputtering) System And Its Application On Depositing Optical Thin Films," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2001), paper MB5.

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Abstract

The RAS (Radical Assisted Sputtering) system was developed to deposit stoichiometric dielectric films with dense microstructures under relative high deposition. Edge filters stacked by such dense films were wavelength shiftless and showed good repeatability and uniformity.

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