Time evolution of SiOF films prepared by evaporation-based deposition

K. Scherer; P. Lacan; R. Bosmans; J. Rivory

doi:10.1364/OIC.2001.MB8

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2001),
paper MB8
•https://doi.org/10.1364/OIC.2001.MB8

Time evolution of SiOF films prepared by evaporation-based deposition

K. Scherer, P. Lacan, R. Bosmans, and J. Rivory

Optical Interference Coatings 2001

Banff Canada
ISBN: 1-55752-682-6

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Deposition of Optical Coatings II (MB)

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K. Scherer, P. Lacan, R. Bosmans, and J. Rivory, "Time evolution of SiOF films prepared by evaporation-based deposition," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2001), paper MB8.

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Abstract

SiOF films were deposited by electron beam evaporation of silica grains under fluorocarbon ion bombardment. Time evolution of these films was characterized by ellipsometry, infrared transmission spectrometry, stress measurements, and secondary neutral mass spectrometry. Films with higher fluorine concentration have lower refractive index just after venting but are less stable.

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