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Conferences > OIC > 2001 > ThA > ThA6

Absorption limited performance of SiO2/Al2O3 multi-layer coatings at 193nm – a systematic study

R. Thielsch, J. Heber, N. Kaiser, O. Apel, K. Mann, D. Ristau, H. Blaschke, and W. Arens

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Abstract

The optical performance and radiation stability of HR193nm - SiO2/Al2O3 – coatings deposited by different technologies (RE, PIAD, IBS) were systematically evaluated and causes for the low LIDT at 193nm compared to 248nm were investigated.

© 2001 Optical Society of America

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