Instrument for light scatter measurements at 157 nm and 193 nm

Jörg Steinert; Stefan Gliech; Marcel Flemming; Angela Duparré

doi:10.1364/OIC.2001.ThA8

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2001),
paper ThA8
•https://doi.org/10.1364/OIC.2001.ThA8

Instrument for light scatter measurements at 157 nm and 193 nm

Jörg Steinert, Stefan Gliech, Marcel Flemming, and Angela Duparré

Optical Interference Coatings 2001

Banff Canada
ISBN: 1-55752-682-6

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Coatings for EUV to UV Wavelengths I (ThA)

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J. Steinert, S. Gliech, M. Flemming, and A. Duparré, "Instrument for light scatter measurements at 157 nm and 193 nm," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2001), paper ThA8.

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Abstract

The instrumentation for total scatter measurement of VUV coatings uses a Coblentz sphere and excimer laser or deuterium lamp radiation. Forward scatter and backscatter measurements on calcium fluoride and AR and HR coatings are presented.

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