Development of Optical Coatings for 157nm Lithography (I: Coating Materials)

Shunsuke Niisaka; Shunsuke Niisaka; Minoru Otani; Minoru Otani; Ryuji Biro; Ryuji Biro; Chidane Ouchi; Chidane Ouchi; Masanobu Hasegawa; Masanobu Hasegawa; Yasuyuki Suzuki; Yasuyuki Suzuki; Tadahiko Saito; Tadahiko Saito; Jun Saito; Jun Saito; Akira Tanaka; Akira Tanaka; Kazuho Sone; Kazuho Sone; Akira Matsumoto; Akira Matsumoto

doi:10.1364/OIC.2001.ThB7

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2001),
paper ThB7
•https://doi.org/10.1364/OIC.2001.ThB7

Development of Optical Coatings for 157nm Lithography (I: Coating Materials)

Shunsuke Niisaka, Minoru Otani, Ryuji Biro, Chidane Ouchi, Masanobu Hasegawa, Yasuyuki Suzuki, Tadahiko Saito, Jun Saito, Akira Tanaka, Kazuho Sone, and Akira Matsumoto

Optical Interference Coatings 2001

Banff Canada
ISBN: 1-55752-682-6

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Coatings for EUV to UV Wavelengths II (ThB)

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S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, and A. Matsumoto, "Development of Optical Coatings for 157nm Lithography (I: Coating Materials)," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2001), paper ThB7.

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Abstract

In the basic study to get low loss optics for F₂ lithography application, potential of 5 coating materials(AlF₃, Na₃AlF₆, MgF₂, LaF₃, GdF₃) and 3 deposition processes(RH, EB,IBS) were investigated in VUV region. They were supplied as single layer coating on CaF₂ substrate from 4 Japanese coating suppliers by each way of processes. Refractive indices (n) and extinction coefficients (k) at 157nm of these coatings were calculated from transmittance and reflectance by VUV spectrometer and compared. RH thermal evaporation was predominant way from the view of optical loss for AR coating. And we have developed the absorptance measurement system and scatterometer for more work.

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