Ultra narrow band pass filters produced by plasma ion assisted deposition

Harro Hagedorn; Armin Lotz; Peter Pecher; Oliver Treichel

doi:10.1364/OIC.2001.WA4

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2001),
paper WA4
•https://doi.org/10.1364/OIC.2001.WA4

Ultra narrow band pass filters produced by plasma ion assisted deposition

Harro Hagedorn, Armin Lotz, Peter Pecher, and Oliver Treichel

Optical Interference Coatings 2001

Banff Canada
ISBN: 1-55752-682-6

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Telecommunication Filters I (WA)

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H. Hagedorn, A. Lotz, P. Pecher, and O. Treichel, "Ultra narrow band pass filters produced by plasma ion assisted deposition," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2001), paper WA4.

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Abstract

Plasma Ion Assisted Deposition (PIAD) with the Advanced Plasma Source (APS) results in 50 GHz narrow band pass filters with FWHM of 0.33 nm at a wavelength of 1550nm. The pass bandwidth was greater than 0.22 nm and the temperature shift could be adjusted between 1 pm/°C and –2 pm/°C.

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