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Conferences > OIC > 2004 > MF > MF2

Room-temperature crystallization of amorphous thin films by RF plasma treatment

H. Ohsaki, Y. Shibayama, A. Kinbara, T. Watanabe, K. Fukuhisa, K. Shinohara, and A. Nakajima

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Abstract

The crystallization of amorphous thin films was achieved by plasma treatment without heating. The gas pressure on the plasma treatment was found to be the key parameter on the crystallization.

© 2004 Optical Society of America

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