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Conferences > OIC > 2007 > FA > FA1

High-Performance Optical Coatings for VUV Lithography Application

Christoph Zaczek, Alexandra Pazidis, and Horst Feldermann

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Abstract

Top level requirements and challenges for optical coatings in the latest generation of 193nm lithography optics are presented. Emphasis is placed on the influence of deposition geometry effects, lens element material, and deposition process on the optical properties of such coatings.

© 2007 Optical Society of America

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