SiOx, SiNx, SiNxOy Deposited By ICP-CVD System With Optimized Uniformity For Optical Coatings

Xiaonan Tan; Jacek Wojcik; Haiqiang Zhang; Peter Mascher

doi:10.1364/OIC.2007.MB4

Optical Interference Coatings
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper MB4
•https://doi.org/10.1364/OIC.2007.MB4

SiO_x, SiN_x, SiN_xO_y Deposited By ICP-CVD System With Optimized Uniformity For Optical Coatings

Xiaonan Tan, Jacek Wojcik, Haiqiang Zhang, and Peter Mascher

Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

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Manufacturing Problem / Deposition of Coatings II (MB)

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X. Tan, J. Wojcik, H. Zhang, and P. Mascher, "SiOx, SiNx, SiNxOy Deposited By ICP-CVD System With Optimized Uniformity For Optical Coatings," in Optical Interference Coatings, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper MB4.

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Abstract

A newly designed ICP-CVD system with in-situ spectroscopic ellipsometry has been constructed and calibrated for the deposition of high quality thin films optimized for optical coatings and other applications.

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