Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

Not Accessible

Your library or personal account may give you access

Abstract

ITO films are suitable to achieve transparent and conductive thin films for a multiplicity of applications. Electrical and optical properties of ITO films prepared by plasma ion-assisted deposition at low substrate temperatures will be presented.

© 2007 Optical Society of America

PDF Article
More Like This
Crystal Phase Transition of HfO2 Films Evaporated by Plasma Ion-Assisted Deposition

Jue Wang, Robert L. Maier, and Horst Schreiber
TuA5 Optical Interference Coatings (OIC) 2007

Plasma ion-assisted deposition of TiO2 and MgF2 thin films

S. H. WOO, C. K. HWANGBO, Y. B. SON, I. C. MOON, and G. M. KANG
MB8 Optical Interference Coatings (OIC) 2004

Thickness Dependence of Electrical and Optical Properties of Indium Tin Oxide Film Deposited by Radio Frequency Magnetron Sputtering

Ge Wang, Lei Zhao, Hongwei Diao, Jingwei Chen, Baojun Yan, Guanghong Wang, and Wenjing Wang
ASa3A.24 Advanced Optoelectronics for Energy and Environment (AOEE) 2013

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2022 | Optica Publishing Group. All Rights Reserved