Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

K. Füchsel; U. Schulz; N. Kaiser

doi:10.1364/OIC.2007.ThB3

Optical Interference Coatings
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper ThB3
•https://doi.org/10.1364/OIC.2007.ThB3

Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

K. Füchsel, U. Schulz, and N. Kaiser

Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

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Measurement Problem / Measurements II (ThB)

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K. Füchsel, U. Schulz, and N. Kaiser, "Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation," in Optical Interference Coatings, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper ThB3.

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Abstract

ITO films are suitable to achieve transparent and conductive thin films for a multiplicity of applications. Electrical and optical properties of ITO films prepared by plasma ion-assisted deposition at low substrate temperatures will be presented.

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