Designing High-Efficiency Interference Coatings With Atomic Layer Deposited TiO2 Layers

Jennifer D. T. Kruschwitz

doi:10.1364/OIC.2007.WA6

Optical Interference Coatings
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper WA6
•https://doi.org/10.1364/OIC.2007.WA6

Designing High-Efficiency Interference Coatings With Atomic Layer Deposited TiO₂ Layers

Jennifer D. T. Kruschwitz

Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

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Design of Optical Coatings I (WA)

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J. D. T. Kruschwitz, "Designing High-Efficiency Interference Coatings With Atomic Layer Deposited TiO2 Layers," in Optical Interference Coatings, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper WA6.

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Abstract

Atomic Layer Deposition (ALD) has enabled the manufacturing of high-efficiency optical interference coatings. This paper reviews the interference coating designing methodology necessary to use TiO₂ as an optical material when deposited using ALD.

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