Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Improving the Optical Properties of Al2O3 by Plasma Etching Deposition

Not Accessible

Your library or personal account may give you access


Fluorine doped Al2O3 films have been deposited by plasma etching deposition of aluminum target with various CF4/O2 gas at room temperature. The film coated with 0.243 CF4/O2 ratio has best optical properties.

© 2010 Optical Society of America

PDF Article
More Like This
Enhancing the Optical and Electrical Properties of SnO2 Films by Plasma Etching Deposition

Bo-Huei Liao, Cheng-Chung Lee, Chien-Cheng Kuo, and Ping-Zen Chen
MC5 Optical Interference Coatings (OIC) 2010

A new process to deposit AlF3 thin films

Bo-Huei Liao, Ming-Chung Liu, and Cheng-Chung Lee
MB5 Optical Interference Coatings (OIC) 2007

Microstructure and Optical Properties of Al2O3 Prepared by Oblique Deposition Using Nanosphere Shell as Templates

Wen-Hao Cho, Chao-Te Lee, Chih-Chieh Yu, Chi-Chung Kei, Da-Ren Liu, and Cheng-Chung Lee
WA8 Optical Interference Coatings (OIC) 2010


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access Optica Member Subscription

Select as filters

Select Topics Cancel
© Copyright 2022 | Optica Publishing Group. All Rights Reserved