Abstract

Empirical Models for the prediction of density and refractive index of optical thin film materials as a function of processing parameters during ion assisted evaporation have been developed for Ta₂O₅ (TiO₂, SiO₂ and MgF₂ under way). These models have been implemented in a computer program for the simulation of evaporation processes in order to predict the spatial distribution of film thickness, film density and film refractive index on optical substrates. Good agreement between theory and experiment is achieved.

© 2010 Optical Society of America