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Conferences > OIC > 2010 > ThA > ThA8

The effects of substrate temperatures on the structure and properties of hafnium dioxide (HfO2) films

Hongfei Jiao, Xinbin Cheng, Yongli Liu, Jiangtao Lu, Bin Ma, Pengfei He, and Zhanshan Wang

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Abstract

X-ray diffraction (XRD) was applied to determine the crystalline phase of HfO2 films, deposited by electron beam evaporation (EB) under different conditions, the results revealed that their microstructures strongly depended on the temperatures of substrates.

© 2010 Optical Society of America

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