Optical Admittance Monitor through a Dynamic Interferometer

K. Wu; M. C. Li; J. C. Wyant; N. Brock; B. Kimbrough; C. C. Lee

doi:10.1364/OIC.2010.TuC5

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper TuC5
•https://doi.org/10.1364/OIC.2010.TuC5

Optical Admittance Monitor through a Dynamic Interferometer

K. Wu, M. C. Li, J. C. Wyant, N. Brock, B. Kimbrough, and C. C. Lee

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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Optical Monitoring (TuC)

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K. Wu, M. C. Li, J. C. Wyant, N. Brock, B. Kimbrough, and C. C. Lee, "Optical Admittance Monitor through a Dynamic Interferometer," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper TuC5.

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Abstract

A way to increase the optical monitoring sensitivity in quarterwave stack fabrication by modified optical admittance loci was demonstrated. The optical admittance value was obtained from an in-situ dynamic interferometer combing with a photodetector, and the result was compared with ellipsometer measurement.

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