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Conferences > OIC > 2010 > WB > WB7

Measurement of the Deformation of Silicon Substrates Coated with a Plasma-Polymerized Acrylonitrile Film

David Sisler, Vincent Tondiglia, Hao Jiang, Jesse O. Enlow, and Rachel Jakubiak

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Abstract

A sensitive interferometric method is employed to quantify the deformation of silicon substrates coated with thin plasma-polymerized acrylonitrile film deposited at room temperature. This provides insight into the structural variation of plasma polymerized films.

© 2010 Optical Society of America

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