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Interface Stress of Oxide Thin Films Produced by DC Pulse Magnetron Sputtering Deposition

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Residual and interface stress of SiO2 and Nb2O5 films on glass, PC, and PET have been investigated. When Nb2O5 was coated on SiO2, the interface stress was tensile. While coated films reversely, it was compressive.

© 2010 Optical Society of America

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