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Deposition of Metallic and Dielectric Molybdenum Films via Modulated Pulse Power Magnetron Sputtering

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Abstract

The frequency and magnitude of the applied voltage pulses were varied under constant oxygen/argon flow rates to obtain alternating layers of molybdenum trioxide (MoO3) and metallic molybdenum (Mo) using a single Mo target.

© 2013 Optical Society of America

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