Abstract
An anti-reflection nano-patterned silicon substrate (NPSiS) has been demonstrated by using self-assembly the single layer nano-sphere and ICP etching process. The average reflectivity of the NPSiS could be reduced to 0.79%.
© 2013 Optical Society of America
PDF ArticleMore Like This
Nan Liu, Yu Hu, and Jian-Jun He
ATh1J.5 Asia Communications and Photonics Conference (ACP) 2014
Nikita Arnold, Boyang Ding, Calin Hrelescu, and Thomas A. Klar
II_P_7 International Quantum Electronics Conference (IQEC) 2013
Yang Liu, Yongqian Ma, Nanling Sun, Yi She, Jun Zhen, and Zhicheng Ye
ASa3A.52 Advanced Optoelectronics for Energy and Environment (AOEE) 2013