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Low-scatter HfO2/SiO2 multilayer enhanced mirror for 1064 nm

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Abstract

HfO2/SiO2 multilayers were deposited on commercial silicon substrates. Angular resolved scatter measurement was performed at 1064 nm. Total backscattering and near angle scattering (0.5° to 2°) were determined to be 10−4 and 10−5, respectively.

© 2013 Optical Society of America

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