Abstract
The refractive index and extinction coefficient are the most important optical characteristics of the optical thin film materials. These optical coating devices with excellence performance are achieved more easily when the selected materials have relatively high refractive index contrast. Here, we used an annealing method to fabricate low refractive index material in a multi-layer structure originated from the Kirkendall effect. An optical thin film of 1.37 low refractive index measured at 550nm was demonstrated by Kirkendall effect successfully.
© 2013 Optical Society of America
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