Abstract

By Effective PVD (EPD) method, SiO₂/TiO₂ multi-layered Anti-Reflection (AR) films were deposited on the plastic substrates at a high-rate without any substrate deformation. Through improvement of material use efficiency by EPD process, SiO₂ and TiO₂ deposition rates were 3.0 and 0.7 nm/sec, respectively. These values were 3.8 and 1.4 times higher than the deposition rates by conventional deposition, respectively. Reflectance spectrum of SiO₂/TiO₂ multi-layered AR film on plastic substrates showed reflectance of below 1% at visible region. Environmental test showed that there is no obvious change for multi-layered AR sample under high-temperature (85°C) and high-humidity (90%RH) conditions for 500 hours. These results indicate that EPD is the most relevant technique for AR coating on the plastic substrates and applicable to industrial production.

© 2013 Optical Society of America