Atomic layer deposition of Al2O3 and TiO2 multilayers for application as broadband antireflection coating

Yanghui Li; Weidong Shen; Yueguang Zhang; Xu Liu

doi:10.1364/OIC.2013.WC.5

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper WC.5
•https://doi.org/10.1364/OIC.2013.WC.5

Atomic layer deposition of Al₂O₃ and TiO₂ multilayers for application as broadband antireflection coating

Yanghui Li, Weidong Shen, Yueguang Zhang, and Xu Liu

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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Deposition: Manufacturing Problem (WC)

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Y. Li, W. Shen, Y. Zhang, and X. Liu, "Atomic layer deposition of Al2O3 and TiO2 multilayers for application as broadband antireflection coating," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper WC.5.

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Abstract

A thick Al₂O₃ film is inserted as a pre-deposited layer to overlay the transition region on bare BK7 in atomic layer deposition. The average reflectance is 0.535% (400~680nm) in practice, compared with the designed 0.408%.

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