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Conferences > OIC > 2016 > FB > FB.5

Pretreatment of PC as a condition for homogeneous etching of AR-nanostructures

Ulrike Schulz, Peter Munzert, Sylvelin Reinhard, Friedrich Rickelt, Heiko Knopf, Christiane Weber, and Norbert Kaiser

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Abstract

The origin of surface defects appearing on plasma etched polycarbonate has been detected and eliminated successfully. As a result, broadband antireflective properties could be achieved homogenously by consecutively etching the substrate and a vacuum deposited organic layer.

© 2016 Optical Society of America

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