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Conferences > OIC > 2016 > MC > MC.5

Structure and stress properties of W/Si multilayers with different background pressure and working pressure

Runze Qi, Qiushi Huang, Yang Yang, Zhong Zhang, and Zhanshan Wang

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Abstract

W/Si multilayers were fabricated under different base pressure and working pressure to optimize the reflectivity and stress for the X-ray telescope application.

© 2016 Optical Society of America

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