Polarization Aberrations Induced by Graded Multilayer Coatings in EUV Lithography

Thiago S. Jota; Russell A. Chipman

doi:10.1364/OIC.2016.TA.5

Optical Interference Coatings 2016
OSA Technical Digest (online) (Optica Publishing Group, 2016),
paper TA.5
•https://doi.org/10.1364/OIC.2016.TA.5

Polarization Aberrations Induced by Graded Multilayer Coatings in EUV Lithography

Thiago S. Jota and Russell A. Chipman

Optical Interference Coatings 2016

Tucson, Arizona United States
19–24 June 2016
ISBN: 978-1-943580-13-2

From the session
Applications III - Automobile, X-ray, EUV to UV Coatings (TA)

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T. S. Jota and R. A. Chipman, "Polarization Aberrations Induced by Graded Multilayer Coatings in EUV Lithography," in Optical Interference Coatings 2016, OSA Technical Digest (online) (Optica Publishing Group, 2016), paper TA.5.

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Abstract

Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

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